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Defect-related emission characteristics of nonpolar m-plane GaN revealed by selective etching 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2011, 卷号: 314, 期号: 1, 页码: 141-145
Authors:  Wei TB;  Yang JK;  Hu Q;  Duan RF;  Huo ZQ;  Wang JX;  Zeng YP;  Wang GH;  Li JM;  Wei, TB, Chinese Acad Sci, Inst Semicond, Semicond Lighting Technol Res & Dev Ctr, Beijing 100083, Peoples R China. tbwei@semi.ac.cn
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Cl  Pl  Stacking Fault  Hvpe  Gan  Nonpolar  Chemical-vapor-deposition  Acceptor Pair Emission  Phase Epitaxy  Grown Gan  Semiconductors  Sapphire  Films  Nitride  
利用极化感应空穴实现p型金属极性宽禁带半导体的方法 专利
专利类型: 发明, 专利号: CN201010128387.0, 公开日期: 2011-08-31
Inventors:  丁凯;  张连;  王军喜;  段瑞飞;  曾一平;  李晋闽
Adobe PDF(337Kb)  |  Favorite  |  View/Download:1121/263  |  Submit date:2011/08/31
氮化镓生长方法 专利
专利类型: 发明, 专利号: CN200810224104.5, 公开日期: 2011-08-31
Inventors:  段瑞飞;  魏同波;  王国宏;  曾一平;  李晋闽
Adobe PDF(242Kb)  |  Favorite  |  View/Download:1162/227  |  Submit date:2011/08/31