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一种氢致解偶合的异质外延用柔性衬底 专利
专利类型: 发明, 申请日期: 2005-03-09, 公开日期: 2009-06-04, 2009-06-11
Inventors:  张志成;  杨少延;  黎大兵;  刘祥林;  陈涌海;  朱勤生;  王占国
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制备低温超薄异质外延用柔性衬底的方法 专利
专利类型: 发明, 申请日期: 2004-03-24, 公开日期: 2009-06-04, 2009-06-11
Inventors:  张志成;  杨少延;  黎大兵;  陈涌海;  朱勤生;  王占国
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键合强度可调节的柔性衬底 专利
专利类型: 发明, 申请日期: 2003-10-29, 公开日期: 2009-06-04, 2009-06-11
Inventors:  张志成;  杨少延;  黎大兵;  陈涌海;  王占国
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Strain accommodation of 3C-SiC grown on hydrogen-implanted Si (001) substrate 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2003, 卷号: 257, 期号: 3-4, 页码: 321-325
Authors:  Zhang ZC;  Chen YH;  Li DB;  Zhang FQ;  Yang SY;  Ma BS;  Sun GS;  Wang ZG;  Zhang XP;  Zhang ZC,Chinese Acad Sci,Lab Semicond Mat Sci,Inst Semicond,Beijing 100083,Peoples R China.
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Substrate  Heteroepitaxy  Low Pressure Chemical Vapor Deposition  Semiconducting Silicon Carbide  Compliant Substrate  Critical Thickness  Silicon  Relaxation  Mechanism  Defects  Layers  
Strain relaxation of InP film directly grown on GaAs patterned compliant substrate 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2002, 卷号: 243, 期号: 1, 页码: 71-76
Authors:  Zhang ZC;  Yang SY;  Zhang FQ;  Li DB;  Chen YH;  Wang ZG;  Zhang ZC,Chinese Acad Sci,Inst Semicond,Lab Semicond Mat Sci,Beijing 100083,Peoples R China.
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Dislocation  Strain  Molecular Beam Epitaxy  Organometallic Vapor Phase Epitaxy  Semiconductor Iii-v Materials  Critical Thickness  Heteroepitaxial Growth  Layers  Oxidation  Epitaxy