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一种在硅衬底上生长无裂纹Ⅲ族氮化物的方法 专利
专利类型: 发明, 申请日期: 2006-08-30, 公开日期: 2009-06-04, 2009-06-11
Inventors:  吴洁君;  韩修训;  李杰民;  黎大兵;  陆沅;  王晓晖
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自适应柔性层制备无裂纹硅基Ⅲ族氮化物薄膜的方法 专利
专利类型: 发明, 申请日期: 2005-12-28, 公开日期: 2009-06-04, 2009-06-11
Inventors:  吴洁君;  黎大兵;  陆沅;  韩修训;  李杰民;  王晓辉;  刘祥林;  王占国
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一种氢致解偶合的异质外延用柔性衬底 专利
专利类型: 发明, 申请日期: 2005-03-09, 公开日期: 2009-06-04, 2009-06-11
Inventors:  张志成;  杨少延;  黎大兵;  刘祥林;  陈涌海;  朱勤生;  王占国
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Crack-free GaN/Si(111) epitaxial layers grown with InAlGaN alloy as compliant interlayer by metalorganic chemical vapor deposition 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2005, 卷号: 279, 期号: 3-4, 页码: 335-340
Authors:  Wu JJ;  Han XX;  Li JM;  Li DB;  Lu Y;  Wei HY;  Cong GW;  Liu XL;  Zhu QS;  Wang ZG;  Wu, JJ, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China. 电子邮箱地址: jiejunw@red.semi.ac.cn
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Cracks  
Effect of misfit dislocation originated from strained layer on photoluminescence properties of InxGa1-xN/GaN multiple quantum wells 期刊论文
CHINESE PHYSICS LETTERS, 2005, 卷号: 22, 期号: 4, 页码: 971-974
Authors:  Lu W;  Li DB;  Li CR;  Chen G;  Zhang Z;  Lu, W, Jilin Univ, Coll Mat Sci & Engn, Dept Mat Sci, Changchun 130012, Peoples R China. 电子邮箱地址: lw@chen.ac.cn
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Optical-properties  
缓冲层厚度对MOCVD法生长GaN外延薄膜性能的影响 期刊论文
人工晶体学报, 2005, 卷号: 34, 期号: 3, 页码: 466-470
Authors:  吴洁君;  韩修训;  李杰民;  黎大兵;  魏宏远;  康亭亭;  王晓晖;  刘祥林;  王占国
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制备低温超薄异质外延用柔性衬底的方法 专利
专利类型: 发明, 申请日期: 2004-03-24, 公开日期: 2009-06-04, 2009-06-11
Inventors:  张志成;  杨少延;  黎大兵;  陈涌海;  朱勤生;  王占国
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Structural and optical properties of quaternary AlInGaN epilayers grown by MOCVD with various TMGa flows 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2004, 卷号: 260, 期号: 3-4, 页码: 388-393
Authors:  Liu JP;  Zhang BS;  Wu M;  Li DB;  Zhang JC;  Jin RQ;  Zhu JJ;  Chen J;  Wang JF;  Wang YT;  Yang H;  Liu, JP, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, POB 912, Beijing 100083, Peoples R China.
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Triple-axis X-ray Diffraction  
Generation and behavior of pure-edge threading misfit dislocations in InxGa1-xN/GaN multiple quantum wells 期刊论文
JOURNAL OF APPLIED PHYSICS, 2004, 卷号: 96, 期号: 9, 页码: 5267-5270
Authors:  Lu W;  Li DB;  Li CR;  Zhang Z;  Li, CR, Chinese Acad Sci, Beijing Lab Electron Microscopy, Inst Phys, POB 603, Beijing 100080, Peoples R China. 电子邮箱地址: crli@aphy.iphy.ac.cn
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Vapor-phase Epitaxy  
Structural and optical properties of 3D growth multilayer InGaN/GaN quantum dots by metalorganic chemical vapor deposition 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2004, 卷号: 266, 期号: 4, 页码: 423-428
Authors:  Han XX;  Chen Z;  Li DB;  Wu JJ;  Li JM;  Sun XH;  Liu XL;  Han PD;  Wang XH;  Zhu QS;  Wang ZG;  Han, XX, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China. 电子邮箱地址: xxhan@red.semi.ac.cn
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Nanostructure