SEMI OpenIR  > 中科院半导体材料科学重点实验室
AlN单晶衬底生产设备及其使用方法
李辉杰; 杨少延; 魏鸿源; 赵桂娟; 汪连山; 李成明; 刘祥林; 王占国
Rights Holder中国科学院半导体所
Date Available2016-09-22
Country中国
Subtype发明
Subject Area半导体材料
Application Date2015-05-14
Application NumberCN201510245599.X
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/27520
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
李辉杰,杨少延,魏鸿源,等. AlN单晶衬底生产设备及其使用方法.
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AlN单晶衬底生产设备及其使用方法.pd(600KB) 限制开放LicenseApplication Full Text
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