SEMI OpenIR  > 中科院半导体材料科学重点实验室
硅基高晶体质量InAsSb平面纳米线的生长方法
杨涛; 杜文娜; 杨晓光; 王小耶; 季祥海; 王占国
Rights Holder中国科学院半导体所
Date Available2016-09-12
Country中国
Subtype发明
Subject Area半导体材料
Application Date2014-12-17
Application NumberCN201410785433.2
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/27449
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
杨涛,杜文娜,杨晓光,等. 硅基高晶体质量InAsSb平面纳米线的生长方法.
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