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无权访问的条目 期刊论文
Authors:  Tang Longjuan;  Zhu Yinfang;  Yang Jinling;  Li Yan;  Zhou Wei;  Xie Jing;  Liu Yunfei;  Yang Fuhua
Adobe PDF(214Kb)  |  Favorite  |  View/Download:1188/503  |  Submit date:2010/11/23
采用光刻和干法刻蚀制作倾斜侧壁二氧化硅结构的方法 专利
专利类型: 发明, 专利号: CN200910081983.5, 公开日期: 2011-08-31
Inventors:  唐龙娟;  杨晋玲;  解婧;  李艳;  杨富华
Adobe PDF(415Kb)  |  Favorite  |  View/Download:1618/287  |  Submit date:2011/08/31