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题名: Influence of heated catalyzer on thermal distribution of substrate in HWCVD system
作者: Zhang Q;  Zhu M;  Wang L;  Liu E
出版日期: 2003
会议日期: SEP 10-13, 2002
摘要: Based on Stefan-Boltzman and Lambert theorems, the radiation energy distribution on substrate (REDS) from catalyzer with parallel filament geometry has been simulated by variation of filament and system layout in hot-wire chemical vapor deposition. The REDS uniformity is sensitive to the distance between filament and substrate d(f-s) when d(f-s) less than or equal to 4 cm. As d(f-s) > 4 cm, the REDS uniformity is independent of d(f-s) and is mainly determined by filament number and filament separation. Two-dimensional calculation shows that the REDS uniformity is limited by temperature decay at filament edges. The simulation data are in good agreement with experiments. (C) 2003 Elsevier Science B.V. All rights reserved.
会议名称: 2nd International Conference on Cat-CVD (Hot-Wire CVD) Process
KOS主题词: amorphous silicon;  sedimentation
会议文集: THIN SOLID FILMS, 430 (1-2)
专题: 中国科学院半导体研究所(2009年前)_会议论文

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推荐引用方式:
Zhang Q; Zhu M; Wang L; Liu E .Influence of heated catalyzer on thermal distribution of substrate in HWCVD system .见:ELSEVIER SCIENCE SA .THIN SOLID FILMS, 430 (1-2),PO BOX 564, 1001 LAUSANNE, SWITZERLAND ,2003,50-53
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