SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Residual donors in undoped LEC InP
Zhao YW; Sun NF; Sun TN; Lin LY; Wu XW; Guo WL; Wu X; Bi KY; Zhao YW Chinese Acad Sci Inst Semicond Ctr Mat Sci POB 912 Beijing 100083 Peoples R China.
2000
Conference Name11th International Semiconducting and Insulating Materials Conference (SIMC-XI)
Source PublicationSIMC-XI: 2000 INTERNATIONAL SEMICONDUCTING AND INSULATING MATERIALS CONFERENCE, PROCEEDINGS
Pages179-182
Conference DateJUL 03-07, 2000
Conference PlaceCANBERRA, AUSTRALIA
Publication Place345 E 47TH ST, NEW YORK, NY 10017 USA
PublisherIEEE
ISBN0-7803-5815-5
metadata_83chinese acad sci, inst semicond, ctr mat sci, beijing 100083, peoples r china
AbstractUndoped liquid encapsulated Czochralski (LEC) InP samples have been studied by Hall effect, glow discharge mass spectroscopy (GDMS) and infrared absorption spectroscopy. A systematic discrepancy has been found between the Han electron concentration and net donor concentration measured by GDMS. The electron concentration is always higher than the net shallow donor concentration by about (3-6)x10(15)cm(-3). A hydrogen indium vacancy complex donor defect VInH4 was detected regularly by infrared absorption spectroscopy in all undoped LEC InP samples. The fact can be explained by taking into account the existence of the donor defect in as-grown undoped LEC-InP.
KeywordIndium-phosphide Carbon Defects Growth
Subject Area半导体材料
Funding OrganizationIEEE Electron Devices Soc.; Australian Natl Univ.; AIXTRON.; Oxford Instruments Plasma Technol.; Ledex Corp.; IEEE ACT Sect.; IEEE Electron Devices Soc, Australian Chapter.; Lasers & Electro-Opt Soc.; Australian Mat Res Soc.
Indexed ByCPCI-S
Language英语
Document Type会议论文
Identifierhttp://ir.semi.ac.cn/handle/172111/13747
Collection中国科学院半导体研究所(2009年前)
Corresponding AuthorZhao YW Chinese Acad Sci Inst Semicond Ctr Mat Sci POB 912 Beijing 100083 Peoples R China.
Recommended Citation
GB/T 7714
Zhao YW,Sun NF,Sun TN,et al. Residual donors in undoped LEC InP[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2000:179-182.
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