一种高Al组分AlGaN薄膜的制备方法 | |
毛德丰; 李维; 王维颖; 金鹏; 王占国 | |
Rights Holder | 中国科学院半导体研究所 |
Date Available | 2014-05-21 |
Country | 中国 |
Subtype | 发明 |
Subject Area | 半导体材料 |
Application Date | 2014-02-19 |
Application Number | CN201410056560.9 |
Document Type | 专利 |
Identifier | http://ir.semi.ac.cn/handle/172111/25750 |
Collection | 中科院半导体材料科学重点实验室 |
Recommended Citation GB/T 7714 | 毛德丰,李维,王维颖,等. 一种高Al组分AlGaN薄膜的制备方法. |
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一种高Al组分AlGaN薄膜的制备方法.(457KB) | 限制开放 | License | Application Full Text |
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