一种提高光栅结构均匀度的电子束曝光方法

	一种提高光栅结构均匀度的电子束曝光方法
	王莉娟; 喻颖; 査国伟; 徐建星; 倪海桥; 牛智川
Rights Holder	中国科学院半导体研究所
Date Available	2014-02-12
Country	中国
Subtype	发明
Subject Area	半导体物理
Application Date	2013-10-25
Application Number	CN201310510519.X
Document Type	专利
Identifier	http://ir.semi.ac.cn/handle/172111/25491
Collection	半导体超晶格国家重点实验室
Recommended Citation GB/T 7714	王莉娟,喻颖,査国伟,等. 一种提高光栅结构均匀度的电子束曝光方法.

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