SEMI OpenIR  > 半导体超晶格国家重点实验室
GaAs半导体材料刻蚀液的配方
李炎勇; 王开友
Rights Holder中国科学院半导体研究所
Date Available2012-08-08
Country中国
Subtype发明
Subject Area半导体物理
Application Date2012-03-23
Application NumberCN201210079731.0
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/25375
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
李炎勇,王开友. GaAs半导体材料刻蚀液的配方.
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GaAs半导体材料刻蚀液的配方.pdf(1500KB) 限制开放LicenseApplication Full Text
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