SEMI OpenIR  > 半导体超晶格国家重点实验室
具有超大垂直矫顽力铁磁单晶薄膜的制备方法
赵建华; 朱礼军
Rights Holder中国科学院半导体研究所
Date Available2012-07-11
Country中国
Subtype发明
Subject Area半导体物理
Application Date2012-02-15
Application NumberCN201210033517.1
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/25368
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
赵建华,朱礼军. 具有超大垂直矫顽力铁磁单晶薄膜的制备方法.
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