The ICP etching technology of 3C-SiC films | |
Ning J (Ning Jin); Gong QC (Gong Quancheng); Sun GS (Sun Guosheng); Liu ZL (Liu Zhongli) | |
2006 | |
Conference Name | International MEMS Conference 2006 |
Source Publication | INTERNATIONAL MEMS CONFERENCE 2006, 34: 511-515 2006 |
Conference Date | MAY 09-12, 2006 |
Conference Place | Singapore, SINGAPORE |
Subject Area | 微电子学 |
Indexed By | CPCI(ISTP) |
Language | 英语 |
Document Type | 会议论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/21414 |
Collection | 半导体集成技术工程研究中心 |
Recommended Citation GB/T 7714 | Ning J ,Gong QC ,Sun GS ,et al. The ICP etching technology of 3C-SiC films[C],2006. |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
The ICP etching tech(325KB) | 限制开放 | License | Application Full Text |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment