| The ICP etching technology of 3C-SiC films | |
| Ning J (Ning Jin); Gong QC (Gong Quancheng); Sun GS (Sun Guosheng); Liu ZL (Liu Zhongli) | |
| 2006 | |
| Conference Name | International MEMS Conference 2006 |
| Source Publication | INTERNATIONAL MEMS CONFERENCE 2006, 34: 511-515 2006 |
| Conference Date | MAY 09-12, 2006 |
| Conference Place | Singapore, SINGAPORE |
| Subject Area | 微电子学 |
| Indexed By | CPCI（ISTP） |
| Language | 英语 |
| Document Type | 会议论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/21414 |
| Collection | 半导体集成技术工程研究中心 |
| Recommended Citation GB/T 7714 | Ning J ,Gong QC ,Sun GS ,et al. The ICP etching technology of 3C-SiC films[C],2006. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| The ICP etching tech（325KB） | 限制开放 | License | Application Full Text | |||
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