Controllable growth of semiconductor nanometer structures
Wang ZG; Wu J; Wang ZG Chinese Acad Sci Inst Semicond Key Lab Semicond Mat Sci POB 912 Beijing 100083 Peoples R China.
2003
会议名称Conference on Low Dimensional Structures and Devices (LDSD)
会议录名称MICROELECTRONICS JOURNAL, 34 (5-8)
页码379-382
会议日期DEC 08-13, 2002
会议地点FORTALEZA, BRAZIL
出版地OXFORD FULFILLMENT CENTRE THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, OXON, ENGLAND
出版者ELSEVIER ADVANCED TECHNOLOGY
ISSN0026-2692
部门归属chinese acad sci, inst semicond, key lab semicond mat sci, beijing 100083, peoples r china
摘要Self-assembled quantum dots and wires were obtained in the InxGa1-xAs/GaAs and InAs/In0.52Al0.48As/InP systems, respectively, using molecular beam epitaxy (MBE). Uniformity in the distribution, density, and spatial ordering of the nanostructures can be controlled to some extent by adjusting and optimizing the MBE growth parameters. In addition, some interesting observation on the InAs wire alignment on InP(001) is discussed. (C) 2003 Elsevier Science Ltd. All rights reserved.
关键词Inas Quantum Dots Self-organization Monolayer Coverage Density Gaas Islands Inp(001) Epitaxy
学科领域半导体材料
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/14839
专题中国科学院半导体研究所(2009年前)
通讯作者Wang ZG Chinese Acad Sci Inst Semicond Key Lab Semicond Mat Sci POB 912 Beijing 100083 Peoples R China.
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Wang ZG,Wu J,Wang ZG Chinese Acad Sci Inst Semicond Key Lab Semicond Mat Sci POB 912 Beijing 100083 Peoples R China.. Controllable growth of semiconductor nanometer structures[C]. OXFORD FULFILLMENT CENTRE THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, OXON, ENGLAND:ELSEVIER ADVANCED TECHNOLOGY,2003:379-382.
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