Fabrication of 1.3 mu m Si-based MEMS tunable optical filter

SEMI OpenIR > 中国科学院半导体研究所（2009年前）

	Fabrication of 1.3 mu m Si-based MEMS tunable optical filter
	Zuo YH; Huang CJ; Cheng BW; Mao RW; Luo LP; Gao JH; Bai YX; Wang LC; Yu JZ; Wang QM; Zuo YH Chinese Acad Sci Inst Semicond State Key Lab Integrated Optoelect Beijing 100083 Peoples R China.
	2002
会议名称	Conference on MEMS/MOEMS Technologies and Applications
会议录名称	MEMS/MOEMS TECHNOLOGIES AND APPLICATIONS, 4928
页码	73-76
会议日期	OCT 17-18, 2002
会议地点	SHANGHAI, PEOPLES R CHINA
出版地	1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA
出版者	SPIE-INT SOC OPTICAL ENGINEERING
ISSN	0277-786X
ISBN	0-8194-4717-X
部门归属	chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china
摘要	In this paper we report the fabrication of 1.3 mum Si-based MEMS tunable optical filter, by surface micromaching. Through wet etching of polyimide sacrificial layer, a tunable Fabry-Perot filter was successfully fabricated. We make the capacitance measurement of the prototype device, compare the experimental curve with the theoretical one, and explain the difference between them.
关键词	Fabry-perot Tunable Filter Surface Micromaching Cavity
学科领域	光电子学
主办者	SPIE.; Chinese Opt Soc.
收录类别	CPCI-S
语种	英语
文献类型	会议论文
条目标识符	http://ir.semi.ac.cn/handle/172111/13613
专题	中国科学院半导体研究所（2009年前）
通讯作者	Zuo YH Chinese Acad Sci Inst Semicond State Key Lab Integrated Optoelect Beijing 100083 Peoples R China.
推荐引用方式 GB/T 7714	Zuo YH,Huang CJ,Cheng BW,et al. Fabrication of 1.3 mu m Si-based MEMS tunable optical filter[C]. 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA:SPIE-INT SOC OPTICAL ENGINEERING,2002:73-76.

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