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Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist 期刊论文
OPTICAL ENGINEERING, 2012, 卷号: 51, 期号: 5, 页码: 54303
Authors:  Du, YD;  Han, WH;  Yan, W;  Xu, XN;  Zhang, YB;  Wang, XD;  Yang, FH;  Cao, HZ;  Jin, F;  Dong, XZ;  Zhao, ZS;  Duan, XM;  Liu, Y
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