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Growth mechanism of InGaAlAs waveguides by narrow stripe selective MOVPE | |
Feng W; Pan WWJQ; Zhu HL; Zhao LJ; Zhou F; Wang LF; Wang BJ; Bian J; An X; Feng, W, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, POB 912, Beijing 100083, Peoples R China. | |
2006 | |
会议名称 | International Symposium on Biophotonics, Nanophotonics and Metamaterials |
会议录名称 | Proceedings of International Symposium on Biophotonics Nanophotonics and Metamaterials |
页码 | 284-287 |
会议日期 | OCT 16-18, 2006 |
会议地点 | Hangzhou, PEOPLES R CHINA |
出版地 | 345 E 47TH ST, NEW YORK, NY 10017 USA |
出版者 | IEEE |
ISBN | 978-0-7803-9773-6 |
部门归属 | chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china |
摘要 | Growth mechanism of InGaAlAs waveguides by narrow stripe selective MOVPE has been studied. Both the InGaAlAs bulk waveguides and the InGaAlAs MQW waveguides were successful grown on the patterned substrates at optimized growth conditions. The mask stripe width varied from 0 to 40 mu m, while the window region width between a pair of mask stripes was fixed 2.5 mu m. These selectively grown waveguides were covered by specific InP layers, which can keep the InGaAlAs waveguides from being oxidized during the fabrication of devices. In particular, there exhibit strong dependences of the photoluminescence (PL) spectrum on the mask stripe width for the samples. The results were explained in considering both the migration effect from a masked region (MMR) and the lateral vapor diffusion effect (LVD). |
关键词 | Vapor-phase Epitaxy |
学科领域 | 光电子学 |
主办者 | Zhejiang Univ.; Royal Inst Technol.; Chinese Univ Hong Kong.; SUNY Buffalo.; IEEE LEOS. |
收录类别 | 其他 |
语种 | 英语 |
文献类型 | 会议论文 |
条目标识符 | http://ir.semi.ac.cn/handle/172111/9848 |
专题 | 中国科学院半导体研究所(2009年前) |
通讯作者 | Feng, W, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, POB 912, Beijing 100083, Peoples R China. |
推荐引用方式 GB/T 7714 | Feng W,Pan WWJQ,Zhu HL,et al. Growth mechanism of InGaAlAs waveguides by narrow stripe selective MOVPE[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2006:284-287. |
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