A Novel Low-Power Digital Baseband Circuit for UHF RFID Tag with Sensors
Zhang, Q; Li, YL; Wu, NJ; Zhang, Q, Chinese Acad Sci, Inst Semicond, Key State Lab Superlattices & Microstruct, Beijing 100083, Peoples R China.
2008
会议名称9th International Conference on Solid-State and Integrated-Circuit Technology
会议录名称2008 9TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY
页码VOLS 1-4: 2120-2123
会议日期OCT 20-23, 2008
会议地点Beijing, PEOPLES R CHINA
出版地345 E 47TH ST, NEW YORK, NY 10017 USA
出版者IEEE
ISBN978-1-4244-2185-5
部门归属[zhang, qi; li, yunlong; wu, nanjian] chinese acad sci, inst semicond, key state lab superlattices & microstruct, beijing 100083, peoples r china
摘要A novel low-power digital baseband circuit for UHF RFID tag with sensors is presented in this paper. It proposes a novel baseband architecture and a new operating scheme to fulfill the sensor functions and to reduce power consumption. It is also compatible with the EPC C1G2 UHF RFID protocol. It adopts some advanced low power techniques for system design and circuit design: adaptive clock-gating, multi-clock domain and asynchronous circuit. The baseband circuit is implemented in 0.18um 1P3M standard CMOS process. ne chip area is 0.28 mm(2) excluding test pads. Its power consumption is 25uW under 1.1V power supply.
学科领域微电子学
主办者IEEE Beijing Sect.; Chinese Inst Elect.; IEEE Electron Devices Soc.; IEEE EDS Beijing Chapter.; IEEE Solid State Circuits Soc.; IEEE Circuites & Syst Soc.; IEEE Hong Kong EDS, SSCS Chapter.; IEEE SSCS Beijing Chapter.; Japan Soc Appl Phys.; Elect Div IEEE.; URSI Commiss D.; Inst Elect Engineers Korea.; Assoc Asia Pacific Phys Soc.; Peking Univ, IEEE EDS Student Chapter.
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/8304
专题中国科学院半导体研究所(2009年前)
通讯作者Zhang, Q, Chinese Acad Sci, Inst Semicond, Key State Lab Superlattices & Microstruct, Beijing 100083, Peoples R China.
推荐引用方式
GB/T 7714
Zhang, Q,Li, YL,Wu, NJ,et al. A Novel Low-Power Digital Baseband Circuit for UHF RFID Tag with Sensors[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2008:VOLS 1-4: 2120-2123.
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