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题名: Study of Si/SiO2 hybrid antireflective coatings on SLD prepared by DSEBET - art. no. 69842P
作者: Sun, MX;  Tan, MQ;  Zhao, M
出版日期: 2008
会议日期: SEP 25-28, 2007
摘要: We introduce a double source electron beam evaporation (DSEBET) technique in this paper. The refractive index coatings were fabricated on K9 glass substrate by adjusting the evaporation rates of two independent sources. The coatings, which were described by atomic force microscopy (AFM), show good compactness and homogeneity. The antireflective (AR) coatings were fabricated on Superluminescent Diodes (SLD) by DSEBET. The hybrid AR coatings on the facets of SLD were prepared in evaporation rates of 0.22nm/s and 0.75nm/s for silicon and silicon dioxide, respectively. The results of AFM and spectral performance of coated SLD show that DSEBET has a promising future in preparing the coatings on optoelectronic devices.
会议名称: 6th International Conference on Thin Film Physics and Applications
KOS主题词: Light emitting diodes
会议文集: THIN FILM PHYSICS AND APPLICATIONS,SIXTH INTERNATIONAL CONFERENCE
专题: 中国科学院半导体研究所(2009年前)_会议论文

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推荐引用方式:
Sun, MX ; Tan, MQ ; Zhao, M .Study of Si/SiO2 hybrid antireflective coatings on SLD prepared by DSEBET - art. no. 69842P .见:SPIE-INT SOC OPTICAL ENGINEERING .THIN FILM PHYSICS AND APPLICATIONS,SIXTH INTERNATIONAL CONFERENCE,1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA ,2008,6984: P9842-P9842
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