Low Temperature Deposited Nano-structured Vanadium Oxide Thin Films for Uncooled Infrared Detectors

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	Low Temperature Deposited Nano-structured Vanadium Oxide Thin Films for Uncooled Infrared Detectors
	Li GK; Wang XD; Liang JR; Ji A; Hu M; Yang F; Liu J; Wu NJ; Chen HD; Li, GK, Chinese Acad Sci, Inst Semicond, Natl Lab Superlattices & Microstruct, Beijing 100083, Peoples R China.
	2008
Conference Name	2nd IEEE International Nanoelectronics Conference
Source Publication	2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE
Pages	VOLS 1-3: 921-923
Conference Date	MAR 24-27, 2008
Conference Place	Shanghai, PEOPLES R CHINA
Publication Place	345 E 47TH ST, NEW YORK, NY 10017 USA
Publisher	IEEE
ISBN	978-1-4244-1572-4
metadata_83	[li, guike; liu, jian; wu, nanjian] chinese acad sci, inst semicond, natl lab superlattices & microstruct, beijing 100083, peoples r china
Abstract	A novel process of room temperature ion beam sputtering deposition of vanadium oxide films and low temperature post annealing for uncooled infrared detectors was proposed in this work. VOx thin films with relatively low square resistance (70 K Omega / square) and large temperature coefficient of resistance (more than 3%/K) at room temperature were fabricated using this low temperature process which was very compatible with the process of uncooled infrared detectors based on micromachined technology. Furthermore, chemical composition and film surface have been characterized using X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) respectively. The results showed that the main composition of the processed thin films was V2O5 and the thin films were in the process of crystallization.
Subject Area	微电子学
Funding Organization	IEEE.
Indexed By	其他
Language	英语
Document Type	会议论文
Identifier	http://ir.semi.ac.cn/handle/172111/7756
Collection	中国科学院半导体研究所（2009年前）
Corresponding Author	Li, GK, Chinese Acad Sci, Inst Semicond, Natl Lab Superlattices & Microstruct, Beijing 100083, Peoples R China.
Recommended Citation GB/T 7714	Li GK,Wang XD,Liang JR,et al. Low Temperature Deposited Nano-structured Vanadium Oxide Thin Films for Uncooled Infrared Detectors[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2008:VOLS 1-3: 921-923.

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