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题名: Low Temperature Deposited Nano-structured Vanadium Oxide Thin Films for Uncooled Infrared Detectors
作者: Li GK;  Wang XD;  Liang JR;  Ji A;  Hu M;  Yang F;  Liu J;  Wu NJ;  Chen HD
出版日期: 2008
会议日期: MAR 24-27, 2008
摘要: A novel process of room temperature ion beam sputtering deposition of vanadium oxide films and low temperature post annealing for uncooled infrared detectors was proposed in this work. VOx thin films with relatively low square resistance (70 K Omega / square) and large temperature coefficient of resistance (more than 3%/K) at room temperature were fabricated using this low temperature process which was very compatible with the process of uncooled infrared detectors based on micromachined technology. Furthermore, chemical composition and film surface have been characterized using X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) respectively. The results showed that the main composition of the processed thin films was V2O5 and the thin films were in the process of crystallization.
会议名称: 2nd IEEE International Nanoelectronics Conference
会议文集: 2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE
专题: 中国科学院半导体研究所(2009年前)_会议论文

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推荐引用方式:
Li, GK ; Wang, XD ; Liang, JR ; Ji, A ; Hu, M ; Yang, F ; Liu, J ; Wu, NJ ; Chen, HD .Low Temperature Deposited Nano-structured Vanadium Oxide Thin Films for Uncooled Infrared Detectors .见:IEEE .2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE,345 E 47TH ST, NEW YORK, NY 10017 USA ,2008,VOLS 1-3: 921-923
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