SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
杂质在硅和砷化镓中行为
梁骏吾
1988
Conference Name新材料研究(庆祝中国科协成立30周年大会报告,第二届中国材料研讨会论文集上册)
Conference Date1988
Conference Place北京. 中国科协学会工作部
Document Type会议论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24945
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
梁骏吾. 杂质在硅和砷化镓中行为[C],1988.
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杂质在硅和砷化镓中行为.pdf(1415KB) 限制开放LicenseApplication Full Text
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