SEMI OpenIR  > 光电子器件国家工程中心
紫外激光干涉条纹的辅助检测装置及方法; 紫外激光干涉条纹的辅助检测装置及方法
郑凯; 赵懿昊; 李全宁; 熊聪
Rights Holder中国科学院半导体研究所
Date Available2012-09-09 ; 2012-09-09 ; 2012-09-09
Country中国
Subtype发明
Abstract 本发明公开了一种紫外激光干涉条纹的辅助检测装置及方法。该辅助检测装置在紫外激光全息光刻系统中增加了一套可见性的激光光路,在确定可见激光波长和紫外激光波长的关系后,通过观察可见激光的干涉条纹来对紫外激光干涉条纹周期进行检测,从而简化了在紫外光全息光刻系统中检测紫外激光干涉条纹的过程,缩短了全息光刻工艺的周期,并降低了光刻工艺的成本。
metadata_83光电子器件国家工程中心
Application Date2011-01-05
Patent NumberCN102141736A
Language中文
Status公开
Application Number CN201110001219.X
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/23400
Collection光电子器件国家工程中心
Recommended Citation
GB/T 7714
郑凯,赵懿昊,李全宁,等. 紫外激光干涉条纹的辅助检测装置及方法, 紫外激光干涉条纹的辅助检测装置及方法. CN102141736A.
Files in This Item:
File Name/Size DocType Version Access License
紫外激光干涉条纹的辅助检测装置及方法.p(872KB) 限制开放LicenseApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[郑凯]'s Articles
[赵懿昊]'s Articles
[李全宁]'s Articles
Baidu academic
Similar articles in Baidu academic
[郑凯]'s Articles
[赵懿昊]'s Articles
[李全宁]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[郑凯]'s Articles
[赵懿昊]'s Articles
[李全宁]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.