SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Photoluminescence of nanocrystalline SiC films prepared by rf magnetron sputtering
Liu JW; Xie FQ; Zhong DY; Wang EG; Liu WX; Li SF; Yang H; Liu JW Chinese Acad Sci Inst Phys State Key Lab Surface Phys POB 603 Beijing 100080 Peoples R China.
2001
Conference NameChinese-German Workshop on Characterization and Development on Nanosystems
Source PublicationCHINESE PHYSICS, 10
PagesS36-S39
Conference DateOCT 30-NOV 02, 2000
Conference PlaceBEIJING, PEOPLES R CHINA
Publication PlaceP O BOX 603, BEIJING 100080, PEOPLES R CHINA
PublisherCHINESE PHYSICAL SOC
ISSN1009-1963
metadata_83chinese acad sci, inst phys, state key lab surface phys, beijing 100080, peoples r china; tianjin univ, sch mat sci & engn, tianjin 300072, peoples r china; chinese acad sci, inst semicond, natl res ctr optoelect technol, beijing 100083, peoples r china
AbstractAmorphous Sic films are deposited on Si (111) substrates by rf magnetron sputtering and then annealed at 1200 degreesC for different times by a dc self-heating method in a vacuum annealing system. The crystallization of the amorphous Sic is determined by Raman scattering at room temperature and X-ray diffraction. The experimental result indicates that the Sic nanocrystals have formed in the films. The topography of the as-annealed films is characterized by atomic force microscopy. Measurements of photoluminescence of the as-annealed films show blue or violet light emission from the nanocrystalline Sic films and photoluminescence peak shifts to short wavelength side as the annealing time decreases.
KeywordLuminescence Sic Nanocrystalline Film Rf Sputtering Raman-scattering
Subject Area半导体材料
Indexed ByCPCI-S
Language英语
Document Type会议论文
Identifierhttp://ir.semi.ac.cn/handle/172111/14925
Collection中国科学院半导体研究所(2009年前)
Corresponding AuthorLiu JW Chinese Acad Sci Inst Phys State Key Lab Surface Phys POB 603 Beijing 100080 Peoples R China.
Recommended Citation
GB/T 7714
Liu JW,Xie FQ,Zhong DY,et al. Photoluminescence of nanocrystalline SiC films prepared by rf magnetron sputtering[C]. P O BOX 603, BEIJING 100080, PEOPLES R CHINA:CHINESE PHYSICAL SOC,2001:S36-S39.
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