Knowledge Management System Of Institute of Semiconductors,CAS
| Nano-layer structure of silicon-on-insulator materials | |
| Wang X; Chen M; Chen J; Dong YN; Liu XH; He P; Tian LL; Liu ZL; Chen J Chinese Acad Sci Shanghai Inst Microsyst & Informat Technol Ion Beam Lab 865 Changning Rd Shanghai 200050 Peoples R China. | |
| 2003 | |
| Conference Name | 11th Seoul International Symposium on the Physics of Semiconductors and Applications |
| Source Publication | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 42 |
| Pages | S713-S718 |
| Conference Date | AUG 20-23, 2002 |
| Conference Place | SEOUL, SOUTH KOREA |
| Publication Place | 635-4, YUKSAM-DONG, KANGNAM-KU, SEOUL 135-703, SOUTH KOREA |
| Publisher | KOREAN PHYSICAL SOC |
| ISSN | 0374-4884 |
| metadata_83 | chinese acad sci, shanghai inst microsyst & informat technol, ion beam lab, shanghai 200050, peoples r china; tsing hua univ, inst microelect, beijing 100084, peoples r china; chinese acad sci, beijing inst semicond, beijing 100864, peoples r china |
| Abstract | Silicon-on-insulator (SOI) has been recognized as a promising semiconductor starting material for ICs where high speed and low power consumption are desirable, in addition to its unique applications in radiation-hardened circuits. In the present paper, three novel SOI nano-layer structures have been demonstrated. ULTRA-THIN SOI has been fabricated by separation by implantation of oxygen (SIMOX) technique at low oxygen ion energy of 45 keV and implantation dosage of 1.81017/cm2. The formed SOI layer is uniform with thickness of only 60 nm. This layer is of crystalline quality. and the interface between this layer and the buried oxide layer is very sharp, PATTERNED SOI nanostructure is illustrated by source and drain on insulator (DSOI) MOSFETs. The DSOI structure has been formed by selective oxygen ion implantation in SIMOX process. With the patterned SOI technology, the floating-body effect and self-heating effect, which occur in the conventional SOI devices, are significantly suppressed. In order to improve the total-dose irradiation hardness of SOI devices, SILICON ON INSULATING MULTILAYERS (SOIM) nano-structure is proposed. The buried insulating multilayers, which are composed of SiOx and SiNy layers, have been realized by implantation of nitride and oxygen ions into silicon in turn at different ion energies, followed by two steps of high temperature annealing process, respectively, Electric property investigation shows that the hardness to the total-dose irradiation of SOIM is remarkably superior to those of the conventional SIMOX SOI and the Bond-and-Etch-Back SOI. |
| Keyword | Soi Nanostructure Microelectronic Materials |
| Subject Area | 半导体材料 |
| Funding Organization | AIXTRON AG.; Epichem Inc.; KODENSHI AUK.; LG Electr Inst Technol.; LUXPIA Co Ltd.; Natl Program Tera Level Nanodevices.; Thomas Swan Sci Equipment Ltd.; Kyung Hee Univ, Adv Display Res Ctr.; Sungkyunkwan Univ, Ctr Nanotubes & Nanostruct Composites.; Dongguk Univ, Quantum Funct Semiconductor Res Ctr.; Chonbuk Natl Univ, Semiconductor Phys Res Ctr. |
| Indexed By | CPCI-S |
| Language | 英语 |
| Document Type | 会议论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/14857 |
| Collection | 中国科学院半导体研究所（2009年前） |
| Corresponding Author | Chen J Chinese Acad Sci Shanghai Inst Microsyst & Informat Technol Ion Beam Lab 865 Changning Rd Shanghai 200050 Peoples R China. |
| Recommended Citation GB/T 7714 | Wang X,Chen M,Chen J,et al. Nano-layer structure of silicon-on-insulator materials[C]. 635-4, YUKSAM-DONG, KANGNAM-KU, SEOUL 135-703, SOUTH KOREA:KOREAN PHYSICAL SOC,2003:S713-S718. |
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| 2823.pdf（1181KB） | 限制开放 | -- | Application Full Text | |||
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