Knowledge Management System Of Institute of Semiconductors,CAS
Fabrication of silicon-on-reflector for Si-based resonant-cavity-enhanced photodetectors | |
Li C; Yang QQ; Ou HY; Wang QM; Li C Chinese Acad Sci Inst Semicond State Key Lab Integrated Optoelect POB 912 Beijing 100083 Peoples R China. | |
2000 | |
会议名称 | 50th Electronic Components & Technology Conference (ECTC 01) |
会议录名称 | 50TH ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE - 2000 PROCEEDINGS |
页码 | 1486-1488 |
会议日期 | MAY 21-24, 2000 |
会议地点 | LAS VEGAS, NV |
出版地 | 345 E 47TH ST, NEW YORK, NY 10017 USA |
出版者 | IEEE |
ISBN | 0-7803-5908-9 |
部门归属 | chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china |
摘要 | A novel silicon-on-reflector substrate for Si-based resonant-cavity-enhanced photodetectors has been fabricated by using Si-based sol-gel and smart-cut techniques. The Si/SiO2 Bragg reflector is controlled in situ by electron beam evaporation and the thickness can be adjusted to get high reflectivity. The reflectance spectra of the silicon-on-reflector substrate with five pairs of Si/SiO2 reflector have been measured and simulated by transfer matrix model. The reflectivity at operating wavelength is close to 100%. Based on the silicon-on-reflector substrate, SiGe/Si multiple quantum wells resonant-cavity-enhanced photodetectors for 1.3 mu m wavelength have been designed and simulated. Ten-fold enhancement of the quantum efficiency of resonant-cavity-enhanced photodetectors compared with conventional photodetectors is predicted. |
关键词 | Mirrors |
学科领域 | 光电子学 |
主办者 | IEEE.; IEEE Components, Packaging & Mfg Technol Soc.; Electe Indust Alliance.; ECA Electr Components, Assemblies, & Mat Assoc. |
收录类别 | CPCI-S |
语种 | 英语 |
文献类型 | 会议论文 |
条目标识符 | http://ir.semi.ac.cn/handle/172111/13767 |
专题 | 中国科学院半导体研究所(2009年前) |
通讯作者 | Li C Chinese Acad Sci Inst Semicond State Key Lab Integrated Optoelect POB 912 Beijing 100083 Peoples R China. |
推荐引用方式 GB/T 7714 | Li C,Yang QQ,Ou HY,et al. Fabrication of silicon-on-reflector for Si-based resonant-cavity-enhanced photodetectors[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2000:1486-1488. |
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