Stress analysis of silica-based arrayed waveguide grating by a finite element method
Deng XQ; Yang QQ; Wang HJ; Hu XW; Wang QM; Deng XQ Chinese Acad Sci Inst Semicond R&D Ctr Optoelect Beijing 100083 Peoples R China.
2002
会议名称Photonics Asia Symposium 2002
会议录名称MATERIALS, DEVICES, AND SYSTEMS FOR DISPLAY AND LIGHTING, 4918
页码444-447
会议日期OCT 14-18, 2002
会议地点SHANGHAI, PEOPLES R CHINA
出版地1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA
出版者SPIE-INT SOC OPTICAL ENGINEERING
ISSN0277-786X
ISBN0-8194-4707-2
部门归属chinese acad sci, inst semicond, r&d ctr optoelect, beijing 100083, peoples r china
摘要The stress distribution in silica optical waveguides on silicon is calculated by using finite element method (FEM). The waveguides are mainly subjected to compressive stress along the x direction and the z direction, and it is accumulated near the interfaces between the core and cladding layers. The shift of central wavelength of silica arrayed waveguide grating (AWG) on silicon-substrate with the designed wavelength and the polarization dependence are caused by the stress in the silica waveguides.
关键词Finite Element Method Stress Silica Optical Waveguide On silicOn Birefringence Optical Wave-guides Difference Method
学科领域光电子学
主办者SPIE.; Chinese Opt Soc.; Shanghai Jiaotong Univ.; Beijing Inst Technol.; Australian Opt Soc.; Opt Soc Korea.; Opt Soc Japan, Japan Soc Appl Phys.; Opt Soc India.; Optoelect Ind & Technol Dev Assoc.; Optoelect Ind Dev Assoc.; KAPID.; Assoc Photon Ind Dev.; Phonton Ind & Dev Assoc.; Chinese Soc Astronaut.; SPIE Asia-Pacific Chapter.
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/13701
专题中国科学院半导体研究所(2009年前)
通讯作者Deng XQ Chinese Acad Sci Inst Semicond R&D Ctr Optoelect Beijing 100083 Peoples R China.
推荐引用方式
GB/T 7714
Deng XQ,Yang QQ,Wang HJ,et al. Stress analysis of silica-based arrayed waveguide grating by a finite element method[C]. 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA:SPIE-INT SOC OPTICAL ENGINEERING,2002:444-447.
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