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Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing 会议论文
AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 507, SAN FRANCISCO, CA, APR 14-17, 1998
作者:  Wang YQ;  Liao XB;  Diao HW;  He J;  Ma ZX;  Yue GZ;  Shen SR;  Kong GL;  Zhao YW;  Li ZM;  Yun F;  Wang YQ Chinese Acad Sci Inst Semicond State Lab Surface Phys POB 912 Beijing 100083 Peoples R China.
Adobe PDF(958Kb)  |  收藏  |  浏览/下载：1205/287  |  提交时间：2010/10/29
Amorphous-silicon  Crystallization  Transistors  
Strain relaxation of GeSi alloy with low dislocation density grown on low-temperature Si buffers 会议论文
JOURNAL OF CRYSTAL GROWTH, 201, CANNES, FRANCE, AUG 31-SEP 04, 1998
作者:  Peng CS;  Chen H;  Zhao ZY;  Li JH;  Dai DY;  Huang Q;  Zhou JM;  Zhang YH;  Tung CH;  Sheng TT;  Wang J;  Peng CS Chinese Acad Sci Inst Phys POB 603 Beijing 100080 Peoples R China.
Adobe PDF(208Kb)  |  收藏  |  浏览/下载：1499/311  |  提交时间：2010/11/15
Threading Dislocation  Si(100)  Layers  Films