Fabrication and characterization of two-dimensional photonic crystal on silicon by efficient methods

SEMI OpenIR > 中国科学院半导体研究所（2009年前）

	Fabrication and characterization of two-dimensional photonic crystal on silicon by efficient methods
	Xu XS (Xu Xingsheng); Wang CX (Wang Chunxia); Li F (Li Fang); Xiong GG (Xiong Guiguang); Liu YL (Liu Yuliang); Chen HD (Chen Hongda); Xu, XS, Chinese Acad Sci, State Key Lab Integrated Optoelect, Inst Semicond, Beijing 100083, Peoples R China.
	2006
会议名称	3rd International Conference on Group IV Photonics
会议录名称	2006 3rd IEEE International Conference on Group IV Photonics
页码	69-71
会议日期	SEP 13-15, 2006
会议地点	Ottawa, CANADA
出版地	345 E 47TH ST, NEW YORK, NY 10017 USA
出版者	IEEE
ISBN	978-1-4244-0095-9
部门归属	chinese acad sci, state key lab integrated optoelect, inst semicond, beijing 100083, peoples r china
摘要	Two-dimensional photonic crystals working in near infrared region are fabricated into silicon-on-insulator wafer by 248-nm deep UV lithography. We present an efficient way to measure the photonic crystal waveguide's light transmission spectra at given polarization states.
关键词	Wave-guide
学科领域	光电子学
主办者	IEEE.
收录类别	其他
语种	英语
文献类型	会议论文
条目标识符	http://ir.semi.ac.cn/handle/172111/9774
专题	中国科学院半导体研究所（2009年前）
通讯作者	Xu, XS, Chinese Acad Sci, State Key Lab Integrated Optoelect, Inst Semicond, Beijing 100083, Peoples R China.
推荐引用方式 GB/T 7714	Xu XS ,Wang CX ,Li F ,et al. Fabrication and characterization of two-dimensional photonic crystal on silicon by efficient methods[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2006:69-71.

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