SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
一种氮化物薄膜外延生长的方法
闫发旺; 高海永; 张 扬; 张会肖; 李晋闽; 曾一平; 王国宏 
2009-06-03
Rights Holder中科院半导体研究所
Date Available3996
Country中国
Subtype发明
Application Date2007-11-28
Language中文
Status公开
Application NumberCN200710178326
Patent Agent汤宝平
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/9144
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
闫发旺,高海永,张 扬,等. 一种氮化物薄膜外延生长的方法[P]. 2009-06-03.
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