Knowledge Management System Of Institute of Semiconductors,CAS
高晶体质量氮化物外延生长所用图形衬底的制备方法 | |
张扬; 闫发旺; 高海永; 曾一平; 王国宏; 张会肖; 李晋闽 | |
2008-10-29 | |
Date Available | 2009-06-04 ; 2009-06-11 |
Subtype | 发明 |
Application Date | 2007-04-25 |
Language | 中文 |
Application Number | CN200710098702.8 |
Document Type | 专利 |
Identifier | http://ir.semi.ac.cn/handle/172111/4233 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 张扬,闫发旺,高海永,等. 高晶体质量氮化物外延生长所用图形衬底的制备方法[P]. 2008-10-29. |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
CN200710098702.8.pdf(561KB) | 限制开放 | -- | Application Full Text |
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