| 一种获得低稀释率涂层的激光熔覆方法 | |
| 林学春; 高文焱; 赵树森; 王奕博; 刘发兰; 周春阳 | |
| Rights Holder | 中国科学院半导体研究所 |
| Date Available | 2013-10-02 |
| Country | 中国 |
| Subtype | 发明 |
| Subject Area | 半导体器件 |
| Application Date | 2013-07-10 |
| Application Number | CN201310288716.1 |
| Document Type | 专利 |
| Identifier | http://ir.semi.ac.cn/handle/172111/25548 |
| Collection | 全固态光源实验室 |
| Recommended Citation GB/T 7714 | 林学春,高文焱,赵树森,等. 一种获得低稀释率涂层的激光熔覆方法. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 一种获得低稀释率涂层的激光熔覆方法.pd（1419KB） | 限制开放 | License | Application Full Text | |||
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