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减少激光剥离损伤的方法; 减少激光剥离损伤的方法
段瑞飞; 王良臣; 刘志强; 季安; 王国宏; 曾一平; 李晋闽
Rights Holder中国科学院半导体研究所
Date Available2011-08-31 ; 2011-08-31 ; 2011-08-31
Country中国
Subtype发明
Abstract一种减少激光剥离损伤的方法,包括如下步骤:步骤1:将外延片置于一底板上;步骤2:将底板加热,该底板加热,是电阻加热、射频加热或外部光源加热,该底板加热的温度范围在100-600℃;步骤3:利用激光剥离设备的激光扫描,对外延片进行剥离,该外延片种类包括:光电子外延材料、微电子外延材料或厚膜外延材料。
metadata_83中科院半导体照明研发中心
Patent NumberCN200910087351.X
Language中文
Status公开
Application NumberCN200910087351.X
Patent Agent汤保平
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/22167
Collection中科院半导体照明研发中心
Recommended Citation
GB/T 7714
段瑞飞,王良臣,刘志强,等. 减少激光剥离损伤的方法, 减少激光剥离损伤的方法. CN200910087351.X.
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