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利用极化感应空穴实现p型金属极性宽禁带半导体的方法
丁凯; 张连; 王军喜; 段瑞飞; 曾一平; 李晋闽
Rights Holder中国科学院半导体研究所
Date Available2011-08-31
Country中国
Subtype发明
Abstract一种利用极化感应空穴实现p型金属极性宽禁带半导体的方法,其步骤包括:步骤1:选取一个衬底;步骤2:在衬底上生长低温成核层,利于成核;步骤3:在低温成核层上生长低温缓冲层,可以减少位错密度,提高晶体质量;步骤4:在低温缓冲层上生长极性宽禁带半导体化合物,完成p型金属极性宽禁带半导体的制备。
metadata_83中科院半导体照明研发中心
Patent NumberCN201010128387.0
Language中文
Status公开
Application NumberCN201010128387.0
Patent Agent汤保平
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/22151
Collection中科院半导体照明研发中心
Recommended Citation
GB/T 7714
丁凯,张连,王军喜,等. 利用极化感应空穴实现p型金属极性宽禁带半导体的方法. CN201010128387.0.
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