Knowledge Management System Of Institute of Semiconductors,CAS
Epitaxial growth of GaNAs/GaAs heterostructure materials | |
Lin YW; Pan Z; Li LH; Zhou ZQ; Wang H; Zhang W; Lin YW Chinese Acad Sci Inst Semicond POB 912 Beijing 100083 Peoples R China. | |
2000 | |
会议名称 | 1st Asian Conference on Chemical Vapour Deposition |
会议录名称 | THIN SOLID FILMS, 368 (2) |
页码 | 249-252 |
会议日期 | MAY 10-13, 1999 |
会议地点 | SHANGHAI, PEOPLES R CHINA |
出版地 | PO BOX 564, 1001 LAUSANNE, SWITZERLAND |
出版者 | ELSEVIER SCIENCE SA |
ISSN | 0040-6090 |
部门归属 | chinese acad sci, inst semicond, beijing 100083, peoples r china |
摘要 | A series of systematic experiments on the growth of high quality GaNAs strained layers on GaAs (001) substrate have been carried out by using DC active Nz plasma, assisted molecular beam epitaxy. The samples of GaNAs between 3 and 200 nm thick were evaluated by double crystal X-ray diffraction (XRD) and photoluminescence (PL) measurements. PL and XRD measurements for these samples are in good agreement. Some material growth and structure parameters affecting the properties of GaNAs/GaAs heterostructure were studied; they were: (1) growth temperature of GaNAs epilayer; (2) electrical current of active N-2 plasma; (3) Nz flow rate; (4) GaNAs growth rate; (5) the thickness of GaNAs strained layer. XRD and PL measurements showed that superlattice with distinct satellite peaks up to two orders and quantum well structure with intensity at 22 meV Fourier transform infrared spectroscopy (FWHM) can be achieved in molecular beam epitaxy (MBE) system. (C) 2000 Published by Elsevier Science S.A. All rights reserved. |
关键词 | Ganas Dc Active N-2 Plasma Molecular Beam Epitaxy Nitrogen Content Fourier Transform Infrared Spectroscopy Of Intensity Band-gap Energy Gaas1-xnx Nitrogen |
学科领域 | 半导体材料 |
主办者 | Chinese Vacuum Soc, Thin Films Comm.; Chinese Electr Soc, Thin Films Comm.; Nat Sci Fdn. |
收录类别 | CPCI-S |
语种 | 英语 |
文献类型 | 会议论文 |
条目标识符 | http://ir.semi.ac.cn/handle/172111/14979 |
专题 | 中国科学院半导体研究所(2009年前) |
通讯作者 | Lin YW Chinese Acad Sci Inst Semicond POB 912 Beijing 100083 Peoples R China. |
推荐引用方式 GB/T 7714 | Lin YW,Pan Z,Li LH,et al. Epitaxial growth of GaNAs/GaAs heterostructure materials[C]. PO BOX 564, 1001 LAUSANNE, SWITZERLAND:ELSEVIER SCIENCE SA,2000:249-252. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
2950.pdf(195KB) | 限制开放 | -- | 请求全文 |
个性服务 |
推荐该条目 |
保存到收藏夹 |
查看访问统计 |
导出为Endnote文件 |
谷歌学术 |
谷歌学术中相似的文章 |
[Lin YW]的文章 |
[Pan Z]的文章 |
[Li LH]的文章 |
百度学术 |
百度学术中相似的文章 |
[Lin YW]的文章 |
[Pan Z]的文章 |
[Li LH]的文章 |
必应学术 |
必应学术中相似的文章 |
[Lin YW]的文章 |
[Pan Z]的文章 |
[Li LH]的文章 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论