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无权访问的条目 期刊论文
作者:  Zhao J (Zhao Jie);  Hu LZ (Hu Lizhong);  Wang ZY (Wang Zhaoyang);  Sun J (Sun Jie);  Wang ZJ (Wang Zhijun);  Zhao, J, Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dept Phys, Dalian 116024, Peoples R China. E-mail: jiezhao@student.dlut.edu.cn
Adobe PDF(400Kb)  |  收藏  |  浏览/下载:1036/370  |  提交时间:2010/04/11
无权访问的条目 期刊论文
作者:  Shi LW (Shi Liwei);  Wang Q (Wang Qiang);  Li YG (Li Yuguo);  Xue CS (Xue Chengshan);  Zhuang HZ (Zhuang Huizhao);  Shi, LW, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China. E-mail: liweishi@semi.ac.en
Adobe PDF(434Kb)  |  收藏  |  浏览/下载:862/269  |  提交时间:2010/04/11
Optical and structural properties of ZnO films grown on Si(100) substrates by MOCVD - art. no. 60290G 会议论文
ICO20 MATERIALS AND NANOSTRUCTURES丛书标题: PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE), Changchun, PEOPLES R CHINA, AUG 21-26, 2005
作者:  Shen, WJ;  Duan, Y;  Wang, J;  Wang, QY;  Zeng, YP;  Shen, WJ, Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, Beijing 100083, Peoples R China.
Adobe PDF(402Kb)  |  收藏  |  浏览/下载:1655/615  |  提交时间:2010/03/29
Zno  Mocvd  Thermal Annealing  Photoluminescence  X-ray Diffraction  Atomic Force Microscopy  Pulsed-laser Deposition  Thin-films  Photoluminescence  Mechanisms  Epitaxy  Cvd  Si  
无权访问的条目 期刊论文
作者:  Zhang S;  Hu Z;  Raniero L;  Liao X;  Ferreira I;  Fortunato E;  Vilarinho P;  Perreira L;  Martins R;  Zhang, S, Univ Nova Lisboa, Fac Ciencias & Tecnol, Dept Ciencia Mat, Campus Caparica, P-2829516 Caparica, Portugal. E-mail: sz@uninova.pt
Adobe PDF(649Kb)  |  收藏  |  浏览/下载:913/238  |  提交时间:2010/04/11
The study of high temperature annealing of a-SiC : H films 会议论文
ADVANCED MATERIALS FORUM III丛书标题: MATERIALS SCIENCE FORUM, Aveiro, PORTUGAL, MAR 20-23, 2005
作者:  Zhang, S;  Hu, Z;  Raniero, L;  Liao, X;  Ferreira, I;  Fortunato, E;  Vilarinho, P;  Perreira, L;  Martins, R;  Zhang, S, Univ Nova Lisboa, Fac Ciencias & Tecnol, Dept Ciencia Mat, Campus Caparica, P-2829516 Caparica, Portugal. 电子邮箱地址: sz@uninova.pt
Adobe PDF(1210Kb)  |  收藏  |  浏览/下载:1409/209  |  提交时间:2010/03/29
Silicon Carbide  High Temperature Annealing  Thin Film  Silicon  Pecvd  
无权访问的条目 期刊论文
作者:  Wang P;  Chen NF;  Yin ZG;  Yang F;  Peng CT;  Wang, P, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, POB 912, Beijing 100083, Peoples R China. E-mail: pwang@mail.semi.ac.cn
Adobe PDF(291Kb)  |  收藏  |  浏览/下载:1056/315  |  提交时间:2010/04/11