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Effects and numerical analysis of argon gas flow on the oxygen concentration in Czochralski silicon single crystal growth 会议论文
MICROELECTRONIC ENGINEERING, 66 (1-4), XIAN, PEOPLES R CHINA, JUN 10-14, 2002
作者:  Zhang ZC;  Ren BY;  Chen YH;  Yang SY;  Wang ZG;  Zhang ZC Chinese Acad Sci Inst Semicond Lab Semicond Mat Sci Beijing 100083 Peoples R China.
Adobe PDF(389Kb)  |  收藏  |  浏览/下载：1296/254  |  提交时间：2010/11/15
Czochralski Method  Growth From Melt  Semiconductor Silicon  Argon Gas Flow  Computer Simulation  Oxygen Content  Furnace Pressure  
The plasmon resonance absorption of Ag/SiO2 nanocomposite films 会议论文
MICROELECTRONIC ENGINEERING, 66 (1-4), XIAN, PEOPLES R CHINA, JUN 10-14, 2002
作者:  Yang L;  Liu YL;  Wang QM;  Shi HZ;  Li GH;  Zhang LD;  Yang L Chinese Acad Sci Inst Semicond State Key Lab Integrated Optoelect Beijing 100083 Peoples R China.
Adobe PDF(111Kb)  |  收藏  |  浏览/下载：1142/257  |  提交时间：2010/11/15
Ag/sio2 Nanocomposite Film  Plasmon Resonance Absorption  Mie Theory  Surface Resonance State  Quantum Size Effect  Image-potential States  Optical-properties  Surfaces  Lifetimes  Particles  Electron  Ag