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Characteristics of high Al content AlGaN grown by pulsed atomic layer epitaxy 期刊论文
APPLIED SURFACE SCIENCE, 2011, 卷号: 257, 期号: 20, 页码: 8718-8721
Authors:  Pan X;  Wang XL;  Xiao HL;  Wang CM;  Yang CB;  Li W;  Wang WY;  Jin P;  Wang ZG
Adobe PDF(549Kb)  |  Favorite  |  View/Download:1431/460  |  Submit date:2011/07/07
Photoluminescence  Raman Scattering  Pulsed Atomic Layer Epitaxy  Algan Alloys  
Growth temperature dependences of InN films grown by MOCVD 期刊论文
APPLIED SURFACE SCIENCE, 2008, 卷号: 255, 期号: 5, 页码: 3149-3152 Part 2
Authors:  Yang, CB;  Wang, XL;  Xiao, HL;  Zhang, XB;  Hua, GX;  Ran, JX;  Wang, CM;  Li, JP;  Li, JM;  Wang, ZG;  Yang, CB, Chinese Acad Sci, Inst Semicond, Novel Mat Lab, Jia 35,Qinghua Dong Rd,POB 912, Beijing 100083, Peoples R China. 电子邮箱地址:
Adobe PDF(534Kb)  |  Favorite  |  View/Download:1165/394  |  Submit date:2010/03/08
Inn  Mocvd  Mobility