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A model for scattering due to interface roughness in finite quantum wells 期刊论文
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2005, 卷号: 20, 期号: 12, 页码: 1207-1212
Authors:  Li JM;  Wu JJ;  Han XX;  Lu YW;  Lin XL;  Zhu QS;  Wang ZG;  Li, JM, Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China. E-mail: jiemli@red.semi.ac.cn
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