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题名: Rapid thermal annealing properties of ZnO films grown using methanol as oxidant
作者: Zhang PF (Zhang, P. F.);  Liu XL (Liu, X. L.);  Wei HY (Wei, H. Y.);  Fan HB (Fan, H. B.);  Liang ZM (Liang, Z. M.);  Jin P (Jin, P.);  Yang SY (Yang, S. Y.);  Jiao CM (Jiao, C. M.);  Zhu QS (Zhu, Q. S.);  Wang ZG (Wang, Z. G.)
发表日期: 2007
摘要: ZnO thin films were grown by metal-organic chemical vapour deposition using methanol as oxidant. Rapid thermal annealing (RTA) was performed in an ambient of one atmosphere oxygen at 900 degrees C for 60 s. The RTA properties of the films have been characterized using scanning electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, photoluminescence spectra and Hall measurement. The grains of the film were well coalesced and the surface became denser after RTA. The full-width at half maximum of rocking curves was only 496 arcsec. The ZnO films were also proved to have good optical quality. The Hall mobility increased to 43.2 cm(2) V-1 s(-1) while the electron concentration decreased to 6.6 x 10(16) cm(-3). It is found that methanol is a potential oxidant for ZnO growth and the quality of ZnO film can be improved substantially through RTA.
KOS主题词: Chemical vapor deposition;  atomic layer deposition;  Vapor-plating
刊名: JOURNAL OF PHYSICS D-APPLIED PHYSICS
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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推荐引用方式:
Zhang, PF (Zhang, P. F.); Liu, XL (Liu, X. L.); Wei, HY (Wei, H. Y.); Fan, HB (Fan, H. B.); Liang, ZM (Liang, Z. M.); Jin, P (Jin, P.); Yang, SY (Yang, S. Y.); Jiao, CM (Jiao, C. M.); Zhu, QS (Zhu, Q. S.); Wang, ZG (Wang, Z. G.) .Rapid thermal annealing properties of ZnO films grown using methanol as oxidant ,JOURNAL OF PHYSICS D-APPLIED PHYSICS,OCT 7 2007,40 (19):6010-6013
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