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题名: Effect of annealing on photoluminescence properties of neon implanted GaN
作者: Majid A;  Ali A;  Zhu JJ;  Wang YT;  Liu W;  Lu GJ;  Liu WB;  Zhang LQ;  Liu ZS;  Zhao DG;  Zhang SM;  Jiang DS;  Yang H
发表日期: 2008
摘要: The effect of thermal annealing on the luminescence properties of neon implanted GaN thin films was studied. Low temperature photoluminescence (PL) measurements were carried out on the samples implanted with different doses ranging from 10(14) to 9 x 10(15) cm(-2) and annealed isochronally at 800 and 900 degrees C. We observed a new peak appearing at 3.44 eV in the low temperative PL spectra of all the implanted samples after annealing at 900 degrees C. This peak has not been observed in the PL spectra of implanted samples annealed at 800 degrees C except for the samples implanted with the highest dose. The intensity of the yellow luminescence (YL) band noticed in the PL spectra measured after annealing was observed to decrease with the increase in dose until it was completely suppressed at a dose of 5 x 10(15) cm(-2). The appearance of a new peak at 3.44 eV and dose dependent suppression of the YL band are attributed to the dissociation of VGaON complexes caused by high energy ion implantation.
KOS主题词: Luminescence
刊名: JOURNAL OF PHYSICS D-APPLIED PHYSICS
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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推荐引用方式:
Majid A ; Ali A ; Zhu JJ ; Wang YT ; Liu W ; Lu GJ ; Liu WB ; Zhang LQ ; Liu ZS ; Zhao, DG ; Zhang SM ; Jiang DS ; Yang H .Effect of annealing on photoluminescence properties of neon implanted GaN ,JOURNAL OF PHYSICS D-APPLIED PHYSICS,2008 ,41(2): Art. No. 025107
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