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Off-stoichiometry effect on magnetic damping in thin films of Heusler alloy C o 2 MnSi
Ting Li;   Wei Yan;   Xinhui Zhang;   Bing Hu;   Kidist Moges;   Tetsuya Uemura;   Masafumi Yamamoto;   Masahito Tsujikawa;   Masafumi Shirai;   Yoshio Miura
2020
Source PublicationPHYSICAL REVIEW B
Volume101Issue:17Pages:174410
Indexed BySCI
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/30245
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Ting Li; Wei Yan; Xinhui Zhang; Bing Hu; Kidist Moges; Tetsuya Uemura; Masafumi Yamamoto; Masahito Tsujikawa; Masafumi Shirai; Yoshio Miura. Off-stoichiometry effect on magnetic damping in thin films of Heusler alloy C o 2 MnSi[J]. PHYSICAL REVIEW B,2020,101(17):174410.
APA Ting Li; Wei Yan; Xinhui Zhang; Bing Hu; Kidist Moges; Tetsuya Uemura; Masafumi Yamamoto; Masahito Tsujikawa; Masafumi Shirai; Yoshio Miura.(2020).Off-stoichiometry effect on magnetic damping in thin films of Heusler alloy C o 2 MnSi.PHYSICAL REVIEW B,101(17),174410.
MLA Ting Li; Wei Yan; Xinhui Zhang; Bing Hu; Kidist Moges; Tetsuya Uemura; Masafumi Yamamoto; Masahito Tsujikawa; Masafumi Shirai; Yoshio Miura."Off-stoichiometry effect on magnetic damping in thin films of Heusler alloy C o 2 MnSi".PHYSICAL REVIEW B 101.17(2020):174410.
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