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(100)-Oriented gallium oxide substrate for metal organic vapor phase epitaxy for ultraviolet emission†
Weijiang Li;   Liang Guo;   Shengnan Zhang;   Qiang Hu;   Hongjuan Cheng;   Junxi Wang;   Jinmin Li;   Tongbo Wei
2020
Source PublicationCRYSTENGCOMM
Volume22Issue:18Pages:3122-3129
Indexed BySCI
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/30217
Collection中科院半导体照明研发中心
Recommended Citation
GB/T 7714
Weijiang Li; Liang Guo; Shengnan Zhang; Qiang Hu; Hongjuan Cheng; Junxi Wang; Jinmin Li; Tongbo Wei. (100)-Oriented gallium oxide substrate for metal organic vapor phase epitaxy for ultraviolet emission†[J]. CRYSTENGCOMM,2020,22(18):3122-3129.
APA Weijiang Li; Liang Guo; Shengnan Zhang; Qiang Hu; Hongjuan Cheng; Junxi Wang; Jinmin Li; Tongbo Wei.(2020).(100)-Oriented gallium oxide substrate for metal organic vapor phase epitaxy for ultraviolet emission†.CRYSTENGCOMM,22(18),3122-3129.
MLA Weijiang Li; Liang Guo; Shengnan Zhang; Qiang Hu; Hongjuan Cheng; Junxi Wang; Jinmin Li; Tongbo Wei."(100)-Oriented gallium oxide substrate for metal organic vapor phase epitaxy for ultraviolet emission†".CRYSTENGCOMM 22.18(2020):3122-3129.
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