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Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation
Yuancheng Wang;  Hongwei Qu;  Yufei Wang;  Fengxin Dong;  Zhonghao Chen;  Wanhua Zheng
2019
Source PublicationACS Omega
Volume4Issue:23Pages:20205-20211
Indexed BySCI
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/29808
Collection固态光电信息技术实验室
Recommended Citation
GB/T 7714
Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng. Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation[J]. ACS Omega,2019,4(23):20205-20211.
APA Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng.(2019).Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation.ACS Omega,4(23),20205-20211.
MLA Yuancheng Wang;Hongwei Qu;Yufei Wang;Fengxin Dong;Zhonghao Chen;Wanhua Zheng."Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α‑SiN x on Photonic CrystalLaser Diodes for Facet Passivation".ACS Omega 4.23(2019):20205-20211.
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