| Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy | |
| Xiangquan Liu ; Jun Zheng ; Lin Zhou ; Zhi Liu ; Yuhua Zuo ; Chunlai Xue ; Buwen Cheng | |
| 2019 | |
| Source Publication | Journal of Alloys and Compounds
 |
| Volume | 785Pages:228-231 |
| Indexed By | SCI |
| Language | 英语 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/29743 |
| Collection | 光电子研究发展中心 |
| Recommended Citation GB/T 7714 | Xiangquan Liu ; Jun Zheng ; Lin Zhou ; Zhi Liu ; Yuhua Zuo ; Chunlai Xue ; Buwen Cheng. Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy[J]. Journal of Alloys and Compounds,2019,785:228-231. |
| APA | Xiangquan Liu ; Jun Zheng ; Lin Zhou ; Zhi Liu ; Yuhua Zuo ; Chunlai Xue ; Buwen Cheng.(2019).Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy.Journal of Alloys and Compounds,785,228-231. |
| MLA | Xiangquan Liu ; Jun Zheng ; Lin Zhou ; Zhi Liu ; Yuhua Zuo ; Chunlai Xue ; Buwen Cheng."Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy".Journal of Alloys and Compounds 785(2019):228-231. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Growth of single cry（1446KB） | 期刊论文 | 作者接受稿 | 限制开放 | CC BY-NC-SA | Application Full Text | |
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