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Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy
Xiangquan Liu ;   Jun Zheng ;   Lin Zhou ;   Zhi Liu ;   Yuhua Zuo ;   Chunlai Xue ;   Buwen Cheng
2019
Source PublicationJournal of Alloys and Compounds
Volume785Pages:228-231
Indexed BySCI
Language英语
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/29743
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
Xiangquan Liu ; Jun Zheng ; Lin Zhou ; Zhi Liu ; Yuhua Zuo ; Chunlai Xue ; Buwen Cheng. Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy[J]. Journal of Alloys and Compounds,2019,785:228-231.
APA Xiangquan Liu ; Jun Zheng ; Lin Zhou ; Zhi Liu ; Yuhua Zuo ; Chunlai Xue ; Buwen Cheng.(2019).Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy.Journal of Alloys and Compounds,785,228-231.
MLA Xiangquan Liu ; Jun Zheng ; Lin Zhou ; Zhi Liu ; Yuhua Zuo ; Chunlai Xue ; Buwen Cheng."Growth of single crystalline GePb film on Ge substrate by magnetron sputtering epitaxy".Journal of Alloys and Compounds 785(2019):228-231.
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