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Morphology control of c-Si via facile copper-assisted chemical etching: Managements on etch end-points
Shuai Zhao;   Guodong Yuan ;   Qi Wang;   Wenqiang Liu;   Shuo Zhang;   Zhiqiang Liu;   Junxi Wang;   Jinmin Li
2019
Source PublicationApplied Surface Science
Volume489Pages:776-785
Indexed BySCI
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/29438
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Shuai Zhao; Guodong Yuan ; Qi Wang; Wenqiang Liu; Shuo Zhang; Zhiqiang Liu; Junxi Wang; Jinmin Li. Morphology control of c-Si via facile copper-assisted chemical etching: Managements on etch end-points[J]. Applied Surface Science,2019,489:776-785.
APA Shuai Zhao; Guodong Yuan ; Qi Wang; Wenqiang Liu; Shuo Zhang; Zhiqiang Liu; Junxi Wang; Jinmin Li.(2019).Morphology control of c-Si via facile copper-assisted chemical etching: Managements on etch end-points.Applied Surface Science,489,776-785.
MLA Shuai Zhao; Guodong Yuan ; Qi Wang; Wenqiang Liu; Shuo Zhang; Zhiqiang Liu; Junxi Wang; Jinmin Li."Morphology control of c-Si via facile copper-assisted chemical etching: Managements on etch end-points".Applied Surface Science 489(2019):776-785.
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