SEMI OpenIR  > 半导体超晶格国家重点实验室
Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons
Xiaoting Wang;   Kedi Wu;   Mark Blei;   Yang Wang;   Longfei Pan;   Kai Zhao;   Chongxin Shan;   Ming Lei;   Yu Cui;   Bin Chen;   David Wright;   Weida Hu;   Sefaattin Tongay;   Zhongming Wei
2019
Source PublicationAdvanced Electronic Materials
Volume5Issue:7Pages:1900419
Indexed BySCI
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/29432
Collection半导体超晶格国家重点实验室
Corresponding AuthorXiaoting Wang;   Kedi Wu;   Mark Blei;   Yang Wang;   Longfei Pan;   Kai Zhao;   Chongxin Shan;   Ming Lei;   Yu Cui;   Bin Chen;   David Wright;   Weida Hu;   Sefaattin Tongay;   Zhongming Wei
Recommended Citation
GB/T 7714
Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei. Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons[J]. Advanced Electronic Materials,2019,5(7):1900419.
APA Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei.(2019).Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons.Advanced Electronic Materials,5(7),1900419.
MLA Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei."Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons".Advanced Electronic Materials 5.7(2019):1900419.
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