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Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack
Qi Hu;   Zhiqiang Fan;   Anping Huang;   Xinjiang Zhang;   Rumeng Zhao;   Qin Gao;   Yuhang Ji;   Wenzhen Dou;   Mei Wang;   Hongliang Shi;   Zhisong Xiao;   Xiangwei Jiang;   Paul K. Chu
2019
Source PublicationJournal of Applied Physics
Volume126Issue:6Pages:065104
Indexed BySCI
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/29405
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Qi Hu; Zhiqiang Fan; Anping Huang; Xinjiang Zhang; Rumeng Zhao; Qin Gao; Yuhang Ji; Wenzhen Dou; Mei Wang; Hongliang Shi; Zhisong Xiao; Xiangwei Jiang; Paul K. Chu. Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack[J]. Journal of Applied Physics,2019,126(6):065104.
APA Qi Hu; Zhiqiang Fan; Anping Huang; Xinjiang Zhang; Rumeng Zhao; Qin Gao; Yuhang Ji; Wenzhen Dou; Mei Wang; Hongliang Shi; Zhisong Xiao; Xiangwei Jiang; Paul K. Chu.(2019).Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack.Journal of Applied Physics,126(6),065104.
MLA Qi Hu; Zhiqiang Fan; Anping Huang; Xinjiang Zhang; Rumeng Zhao; Qin Gao; Yuhang Ji; Wenzhen Dou; Mei Wang; Hongliang Shi; Zhisong Xiao; Xiangwei Jiang; Paul K. Chu."Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack".Journal of Applied Physics 126.6(2019):065104.
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