Crystal quality improvement of sputtered AlN film on sapphire substrate by high-temperature annealing

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	Crystal quality improvement of sputtered AlN film on sapphire substrate by high-temperature annealing
	Lu Zhao ; Kun Yang Yujie Ai ; Lian Zhang ; Xiaolong Niu Hongrui Lv ; Yun Zhang
	2018
Source Publication	Journal of Materials Science: Materials in Electronics
Volume	29 Issue:16 Pages:13766-13773
Indexed By	SCI
Document Type	期刊论文
Identifier	http://ir.semi.ac.cn/handle/172111/29264
Collection	固态光电信息技术实验室
Recommended Citation GB/T 7714	Lu Zhao ; Kun Yang Yujie Ai ; Lian Zhang ; Xiaolong Niu Hongrui Lv ; Yun Zhang. Crystal quality improvement of sputtered AlN film on sapphire substrate by high-temperature annealing[J]. Journal of Materials Science: Materials in Electronics,2018,29(16):13766-13773.
APA	Lu Zhao ; Kun Yang Yujie Ai ; Lian Zhang ; Xiaolong Niu Hongrui Lv ; Yun Zhang.(2018).Crystal quality improvement of sputtered AlN film on sapphire substrate by high-temperature annealing.Journal of Materials Science: Materials in Electronics,29(16),13766-13773.
MLA	Lu Zhao ; Kun Yang Yujie Ai ; Lian Zhang ; Xiaolong Niu Hongrui Lv ; Yun Zhang."Crystal quality improvement of sputtered AlN film on sapphire substrate by high-temperature annealing".Journal of Materials Science: Materials in Electronics 29.16(2018):13766-13773.

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