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Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking
Wei-fang Zhao; Hua Yu; Meng-zhou Liao; Ling Zhang; Shu-zhen Zou; Hai-juan Yu; Chao-jian He; Jing-yuan Zhang; Guang-yu Zhang; Xue-chun Lin
2017
Source PublicationSemiconductor Science and Technology
Volume32Issue:2017Pages:025013 (6pp)
Subject Area半导体器件
Indexed BySCI
Date Available2018-11-30
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/28828
Collection全固态光源实验室
Recommended Citation
GB/T 7714
Wei-fang Zhao,Hua Yu,Meng-zhou Liao,et al. Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking[J]. Semiconductor Science and Technology,2017,32(2017):025013 (6pp).
APA Wei-fang Zhao.,Hua Yu.,Meng-zhou Liao.,Ling Zhang.,Shu-zhen Zou.,...&Xue-chun Lin.(2017).Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking.Semiconductor Science and Technology,32(2017),025013 (6pp).
MLA Wei-fang Zhao,et al."Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking".Semiconductor Science and Technology 32.2017(2017):025013 (6pp).
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